Rate the Article: Numerical Simulation of a Microwave Argon PACVD Plasma Reactor at Low Pressure, IJSR, Call for Papers, Online Journal
International Journal of Science and Research (IJSR)

International Journal of Science and Research (IJSR)
Call for Papers | Fully Refereed | Open Access | Double Blind Peer Reviewed

ISSN: 2319-7064

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Research Paper | Mechanical Engineering | Morocco | Volume 9 Issue 12, December 2020 | Rating: 6.7 / 10


Numerical Simulation of a Microwave Argon PACVD Plasma Reactor at Low Pressure

Mohamed El Haim, Mohamed Atounti


Abstract: Discharge characteristics of argon microwave plasma were investigated by using fluid simulation of a MPACVD (Microwave Plasma Assisted Chemical Vapor Deposition) reactor based on finite elements method at low pressure (25-250) Pa. The microwave power was 2.45 GHz TM mode transmitted through the resonant cavity. Microwave power and pressure were considered simulation parameters and argon was used for working gas. A self-consistent fluid model was developed in Comsol Multiphysics Plasma Module for studying the discharge phenomena. The 2D plasma fluid model gives a complete description of spatial-and time evolution of the discharge characteristics such us: electron density and electron temperature. Simulation results show a strong effect of input parameters on the species densities distribution in the plasma.


Keywords: Finite element method, COMSOL MWP module, microwave plasma, plasma fluid model


Edition: Volume 9 Issue 12, December 2020,


Pages: 16 - 19



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